High-Resolution RBS System (HRBS-V500、HRBS1000)

High-Resolution RBS System (HRBS-V500、HRBS1000)

1/15 High-Resolution RBS System (HRBS-V500、HRBS1000) KOBE STEEL, LTD. Machinery & Engineering Company Advanced Product & Technologies Dept. Outline ...

3MB Sizes 1 Downloads 9 Views

1/15

High-Resolution RBS System (HRBS-V500、HRBS1000) KOBE STEEL, LTD. Machinery & Engineering Company Advanced Product & Technologies Dept.

Outline ・ History for RBS Equipment ・ Hardware of HRBS-V500 ・ Principle of RBS ・ Principle of High-Resolution RBS ・ Examples of High-Resolution RBS ・ Principle & Examples of High-Resolution ERDA ・ Principle of PIXE ・ Comparison of instrumentation

History for RBS Equipment

2/15

4/15

Principle of RBS 10000

Si

Yield

1000

Si

He+

100 10

Sample1

1 0

100

200

300

channel 10000

500

Au + Si Au He

Si

1000

Yield

400

100 10

Sample2

1 0

100

200

300

channel 10000

500

Au

Si

1000

Yield

400

Si Au Si

He+

100

Sample3

10 1 0

100

200

300

channel

400

500

Comparison between conventional ERDA & HERDA Comparison by DLC(Diamond like Carbon) spectrum between conventional ERDA & HERDA

1MeV He+ → DLC mikro-i

Conventional ERDA

500keV N+ → DLC HRBS500

High Resolution ERDA Depth resolution < 0.2nm

Hydrogen depth profile in thin film was CLEARLY measured!!

11/15

14/15

Principle of PIXE(Particle Induced X-ray Emission) When Ion collides with atom, it radiates charasteristic X-ray which is unique in each element. By detecting this X-ray, it turns out what elements and how many elements are included. The feature of PIXE is high detection sensivity which is about ppm order. L-Xray β

K-Xray

α

α

β

M

Lα Kα Lβ

K K

L

Lγ L

M

β Ion Electron

α M



15/15

Comparison of instrumentation(evaluation of thin film)

RBS

Principle Method /Feature Probe Detection Particle

SIMS

HRBS 500 Old RBS Double Semiconduc focussing tor magnet&MCP detector 500keV He 1Mev He Scattered ion

AES

TEM

STM

XRR

Cross Section

X Ray Reflection

Cs/O ion

electron

electron

Scanning Tunnel electron needle

Secondary ion

Auger electron

Transmission electron

Tunnel current

High Power X Ray X線反射率 干渉振動

non-destructive





×

×

×





Depth resolution

0.2∼0.3nm

10nm

5nm

2nm

0.01nm

×

2∼10nm

Composition











×

×

Sensitivity

1%

0.50%

0.0001%

0.50%

Few %

Few %

Few %

Reliability









△∼☆





User-friendly















Simplicity of use

Attention is needed for surface treatment

Sensivity adjustment is needed

Charge up measure is needed

Preparation of sample is needed

Attention is needed for surface treatment